Method of doping a conductive layer near a via

Details Method of doping a conductive layer near a via Method of doping a conductive layer near a via

2007-11-27

2007-11-27

Whitehead, Jr., Carl (Department: 2813)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

Reexamination Certificate

active

10984604

ABSTRACT:
A method of making a semiconductor device is described. That method comprises forming a conductive layer that contacts a via, such that the conductive layer includes a higher concentration of an electromigration retarding amount of a dopant near the via than away from the via.

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