Method of developing a self-developing resist

Details Method of developing a self-developing resist Method of developing a self-developing resist

1990-06-29

1993-01-26

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430945, 430324, 430322, 430271, 2503161, 2504921, 21912165, 21912166, 2191217, 21912171, 427555, G03F 736

Patent

active

051821885

ABSTRACT:
Self-developing photoresists are developed by exposing the substrate on which they are exposed to a light beam or other energy source which is absorbed by the substrate and which raises the substrate temperature to the thermal decomposition temperature of the overlying photoresist. This exposure may be done through the photoresist layer with a light beam having a frequency to which the photoresist is substantially transparent or may be done from the backside of the substrate using a light beam which is absorbed by the substrate itself if it is sufficiently thin, or by a thin layer disposed on a transparent substrate.

REFERENCES:
patent: 3410979 (1968-11-01), Larsson
patent: 4430401 (1984-02-01), Wilkinson
patent: 4877644 (1989-10-01), Wu et al.
patent: 5035918 (1991-07-01), Vyas

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