Method of detecting pattern defect and its apparatus

Details Method of detecting pattern defect and its apparatus Method of detecting pattern defect and its apparatus

1984-04-27

1986-09-30

Rosenberger, R. A.

Optics: measuring and testing

By configuration comparison

With comparison to master, desired shape, or reference voltage

382 8, H06N 718

Patent

active

046144307

ABSTRACT:
A pattern defect is detected in accordance with the difference between a pair of patterns. The patterns are scanned and imaged to obtain first and second binary signals. A positioning error between the patterns is two-dimensionally detected during the scanning with respective first and second binary signals delayed by a prescribed amount so that each of the picture elements in a prescribed area of a two-dimensional image, delayed and cut out two-dimensionally, corresponding to one pattern, is compared with a specified picture element in a predetermined area of an image delayed and cut out two-dimensionally corresponding to another pattern. The result of the comparison is statistically summed to derive a positioning error by detecting the position shown as an extreme value from the summed values. The positioning error is corrected by two-dimensionally shifting at least one of the delayed binary signals. The corrected binary signals are then two-dimensionally compared with each other.

REFERENCES:
patent: 4421410 (1983-12-01), Karasaki
patent: 4508453 (1985-04-01), Hara et al.

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