Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2011-08-30
2011-08-30
McDonald, Rodney G (Department: 1723)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C156S345240, C156S345280, C313S231410, C313S231710, C315S150000, C204S192100, C204S192380
Reexamination Certificate
active
08007641
ABSTRACT:
An arc discharge detection device is used for detecting arc discharges in a plasma process. The arc discharge detection device includes a comparator to which an instantaneous signal and a reference value are supplied. The reference value is formed by a setting means from an extreme value of the signal. The extreme value is determined by an extreme value detection device within a predetermined time period, and the comparator changes the state of an arc discharge detection signal when the comparison between the reference value and an instantaneous value of the signal shows that an arc discharge has occurred.
REFERENCES:
patent: 4031464 (1977-06-01), Norberg
patent: 4396478 (1983-08-01), Aizenshtein et al.
patent: 4588952 (1986-05-01), Matsuoka
patent: 4625283 (1986-11-01), Hurley
patent: 4694402 (1987-09-01), McEachern et al.
patent: 4936960 (1990-06-01), Siefkes et al.
patent: 5192894 (1993-03-01), Teschner
patent: 5241152 (1993-08-01), Anderson et al.
patent: 5543689 (1996-08-01), Ohta et al.
patent: 5576939 (1996-11-01), Drummond
patent: 5611899 (1997-03-01), Maass
patent: 5698082 (1997-12-01), Teschner et al.
patent: 5718813 (1998-02-01), Drummond et al.
patent: 5729145 (1998-03-01), Blades
patent: 5804975 (1998-09-01), Alers et al.
patent: 5889391 (1999-03-01), Coleman
patent: 5993615 (1999-11-01), Abry et al.
patent: 6007879 (1999-12-01), Scholl
patent: 6060837 (2000-05-01), Richardson et al.
patent: 6063245 (2000-05-01), Frach et al.
patent: 6162332 (2000-12-01), Chiu
patent: 6213050 (2001-04-01), Liu et al.
patent: 6332961 (2001-12-01), Johnson et al.
patent: 6416638 (2002-07-01), Kuriyama et al.
patent: 6420863 (2002-07-01), Milde et al.
patent: 6472822 (2002-10-01), Chen et al.
patent: 6535785 (2003-03-01), Johnson et al.
patent: 6545420 (2003-04-01), Collins et al.
patent: 6621674 (2003-09-01), Zahringer et al.
patent: 6633017 (2003-10-01), Drummond et al.
patent: 6736944 (2004-05-01), Buda
patent: 6740207 (2004-05-01), Kloeppel et al.
patent: 6753499 (2004-06-01), Yasaka et al.
patent: 6783795 (2004-08-01), Inoue et al.
patent: 6791274 (2004-09-01), Hauer et al.
patent: 6859042 (2005-02-01), Parker
patent: 6878248 (2005-04-01), Signer et al.
patent: 6943317 (2005-09-01), Ilic et al.
patent: 6967305 (2005-11-01), Sellers
patent: 7016172 (2006-03-01), Escoda
patent: 7081598 (2006-07-01), Ilic et al.
patent: 7262606 (2007-08-01), Axenbeck et al.
patent: 7301286 (2007-11-01), Kuriyama
patent: 7408750 (2008-08-01), Pellon et al.
patent: 2003/0227290 (2003-12-01), Parker
patent: 2004/0031699 (2004-02-01), Shoji
patent: 2004/0079733 (2004-04-01), Kawaguchi et al.
patent: 2004/0182697 (2004-09-01), Buda
patent: 2004/0212312 (2004-10-01), Chistyakov
patent: 2005/0051270 (2005-03-01), Sasaki et al.
patent: 2005/0093459 (2005-05-01), Kishinevsky
patent: 2005/0135025 (2005-06-01), Escoda
patent: 2006/0011473 (2006-01-01), Kuriyama et al.
patent: 2006/0054601 (2006-03-01), Ilic et al.
patent: 2006/0100824 (2006-05-01), Moriya
patent: 2006/0181816 (2006-08-01), Pellon et al.
patent: 2006/0213761 (2006-09-01), Axenbeck et al.
patent: 2007/0121267 (2007-05-01), Kotani et al.
patent: 2007/0168143 (2007-07-01), Axenbeck et al.
patent: 2007/0251813 (2007-11-01), Ilic et al.
patent: 2008/0121517 (2008-05-01), Nitschke
patent: 2008/0121625 (2008-05-01), Zaehringer
patent: 2008/0122369 (2008-05-01), Nitschke
patent: 2008/0133154 (2008-06-01), Krauss
patent: 2008/0216745 (2008-09-01), Wiedemuth et al.
patent: 2008/0218923 (2008-09-01), Wiedemuth
patent: 2008/0257869 (2008-10-01), Nitschke et al.
patent: 4127504 (1993-02-01), None
patent: 43 26 100 (1995-02-01), None
patent: 4326100 (1995-02-01), None
patent: 4420951 (1995-12-01), None
patent: 19651615 (1997-07-01), None
patent: 19848636 (2000-05-01), None
patent: 10034895 (2002-02-01), None
patent: 10119058 (2002-10-01), None
patent: 102006002333 (2007-07-01), None
patent: 0713242 (1996-05-01), None
patent: 0 967 697 (1999-12-01), None
patent: 0 692 138 (2004-01-01), None
patent: 1 441 576 (2004-07-01), None
patent: 1 441 586 (2006-06-01), None
patent: 1705687 (2006-09-01), None
patent: 1720195 (2006-11-01), None
patent: 1 121 705 (2009-01-01), None
patent: 06132095 (1994-05-01), None
patent: 08-167500 (1996-06-01), None
patent: 08222398 (1996-08-01), None
patent: 09170079 (1997-06-01), None
patent: 2000117146 (2000-04-01), None
patent: 2005077248 (2005-03-01), None
patent: WO 94/25977 (1994-11-01), None
patent: WO 01/13402 (2001-02-01), None
patent: WO 03/037047 (2003-05-01), None
patent: WO 03/088445 (2003-10-01), None
patent: WO 2006/014212 (2006-02-01), None
patent: WO2006116445 (2006-11-01), None
Ochs et al., “Advanced Power Supplies designed for Plasma Deposition and Etching”, Vakuum In Forschung und Praxis, vol. 8, No. 5, Sep. 26, 2006, pp. 32-36.
Van Zyl et al., “Managing Arcs in RF Powered Plasma Processes”, Society of Vacuum Coaters, 48thAnnual Technical Conference Proceedings, 2005, pp. 44-49.
Zlatanovic et al., “Glow-to-Arc Transition Instability Sensor in Processing Plasma”, Proc. 20thInternational Conference on Microelectronics, vol. 2, Sep. 12-14, 1995, pp. 597-600.
International Preliminary Report on Patentability for corresponding PCT Application No. PCT/EP2005/002069, with translation, mailed Nov. 15, 2006, 25 pages.
Translation of Office Action from correspondence Japanese Application No. 2007-504279, dated Sep. 28, 2009, 4 pages.
Translation of the relevant parts of the Office Action fort corresponding European Patent Application No. 05 715 593.0, dated Aug. 19, 2010, 11 pages.
Wiedemuth Peter
Winterhalter Markus
Band Michael
Fish & Richardson P.C.
Huettinger Elektronik GmbH & Co. KG
McDonald Rodney G
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