Method of design based process control optimization

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C716S030000, C716S030000, C716S030000

Reexamination Certificate

active

07571397

ABSTRACT:
The present invention provides a method of design based process control optimization. In an embodiment, the method of design based process control optimization includes creating a circuit layout database including a design rule set. At least one algorithm is employed to query the circuit layout database to calculate at least one process specification limit. The method includes comparing the calculated at least one process specification limit with at least one predefined technology process tool capability to determine if the calculated at least one process specification limit allows for a manufacturable process. If the calculated at least one process specification limit does not allow for the manufacturable process, the limit may be re-optimized.

REFERENCES:
patent: 2006/0236296 (2006-10-01), Melvin et al.
patent: 2007/0099313 (2007-05-01), Hanson et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of design based process control optimization does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of design based process control optimization, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of design based process control optimization will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4104085

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.