Method of creating a template employing a lift-off process

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

Reexamination Certificate

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C430S005000, C430S312000, C430S316000, C430S317000, C430S318000, C430S331000, C430S311000

Reexamination Certificate

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07906274

ABSTRACT:
A method of forming a lithographic template, the method including, inter alia, creating a multi-layered structure, by forming, on a body, a conducting layer, and forming on the conducting layer, a patterned layer having protrusions and recessions, the recessions exposing portions of the conducting layer; depositing a hard mask material anisotropically on the multi-layered structure covering a top surface of the patterned layer and the portions of the conducting layer; removing the patterned layer by a lift-off process, with the hard mask material remaining on the portions of the conducting layer; positioning a resist pattern on the multi-layered structure to define a region of the multi-layered structure; and selectively removing portions of the multi-layered structure in superimposition with the region using the hard mask material as an etching mask.

REFERENCES:
patent: 3677178 (1972-07-01), Gipe
patent: 4190488 (1980-02-01), Winters
patent: 4201800 (1980-05-01), Alcorn et al.
patent: 4498953 (1985-02-01), Cook et al.
patent: 5348616 (1994-09-01), Hartman et al.
patent: 5817376 (1998-10-01), Everaerts et al.
patent: 5853446 (1998-12-01), Carre et al.
patent: 5885514 (1999-03-01), Tensor
patent: 5952127 (1999-09-01), Yamanaka
patent: 6051345 (2000-04-01), Huang
patent: 6207570 (2001-03-01), Mucha
patent: 6251207 (2001-06-01), Schultz et al.
patent: 6274393 (2001-08-01), Hartswick
patent: 6284653 (2001-09-01), Tseng
patent: 6309957 (2001-10-01), Tu
patent: 6334960 (2002-01-01), Willson et al.
patent: 6517977 (2003-02-01), Resnick et al.
patent: 6696220 (2004-02-01), Bailey et al.
patent: 6716754 (2004-04-01), Hofmann
patent: 6743368 (2004-06-01), Lee
patent: 6753131 (2004-06-01), Rogers et al.
patent: 6780001 (2004-08-01), Eldridge et al.
patent: 6808646 (2004-10-01), Jeans
patent: 6852358 (2005-02-01), Chen et al.
patent: 6852454 (2005-02-01), Mancini et al.
patent: 6873087 (2005-03-01), Choi et al.
patent: 6878985 (2005-04-01), Arai et al.
patent: 6890688 (2005-05-01), Mancini et al.
patent: 6900881 (2005-05-01), Sreenivasan et al.
patent: 6916584 (2005-07-01), Sreenivasan et al.
patent: 6919152 (2005-07-01), Sreenivasan et al.
patent: 6932934 (2005-08-01), Choi et al.
patent: 6936194 (2005-08-01), Watts
patent: 6986975 (2006-01-01), Sreenivasan et al.
patent: 7027156 (2006-04-01), Watts et al.
patent: 7037639 (2006-05-01), Voisin
patent: 7070405 (2006-07-01), Sreenivasan et al.
patent: 7077992 (2006-07-01), Sreenivasan et al.
patent: 7122482 (2006-10-01), Xu et al.
patent: 7136150 (2006-11-01), Sreenivasan et al.
patent: 7140861 (2006-11-01), Watts et al.
patent: 7179396 (2007-02-01), Sreenivasan
patent: 7229273 (2007-06-01), Bailey et al.
patent: 7279113 (2007-10-01), Watts et al.
patent: 7281921 (2007-10-01), Watts et al.
patent: 7309225 (2007-12-01), McMackin et al.
patent: 7396475 (2008-07-01), Sreenivasan
patent: 7547398 (2009-06-01), Schmid et al.
patent: 2002/0135099 (2002-09-01), Robinson et al.
patent: 2003/0139042 (2003-07-01), Heidari
patent: 2003/0180631 (2003-09-01), Shiota et al.
patent: 2003/0232252 (2003-12-01), Mancini et al.
patent: 2004/0065252 (2004-04-01), Sreenivasan et al.
patent: 2004/0065976 (2004-04-01), Sreenivasan et al.
patent: 2004/0150129 (2004-08-01), Hougham et al.
patent: 2004/0202865 (2004-10-01), Homola et al.
patent: 2005/0064344 (2005-03-01), Bailey et al.
patent: 2005/0084804 (2005-04-01), Truskett et al.
patent: 2005/0098534 (2005-05-01), Sreenivasan et al.
patent: 2005/0158900 (2005-07-01), Lee et al.
patent: 2005/0189676 (2005-09-01), Sreenivasan
patent: 2005/0230882 (2005-10-01), Watts et al.
patent: 2005/0285308 (2005-12-01), Hattori et al.
patent: 2006/0019183 (2006-01-01), Voisin
patent: 2006/0067650 (2006-03-01), Chui
patent: 2006/0113697 (2006-06-01), Sreenivasan
patent: 2006/0266916 (2006-11-01), Miller et al.
patent: 2007/0026324 (2007-02-01), Yoshida et al.
patent: 2007/0026542 (2007-02-01), Sreenivasan et al.
patent: 2007/0122942 (2007-05-01), Sreenivasan et al.
patent: 2007/0247608 (2007-10-01), Sreenivasan et al.
patent: 2008/0095878 (2008-04-01), Bailey et al.
patent: 2008/0292805 (2008-11-01), Tamura et al.
patent: 1460738 (2004-09-01), None
patent: 61-40845 (1986-02-01), None
patent: WO 01/90816 (2001-11-01), None
patent: WO 02/22916 (2002-03-01), None
patent: 2007117519 (2007-10-01), None
patent: WO2008097278 (2008-11-01), None
patent: WO2009067149 (2009-05-01), None
PCT/US2008/12637 International Search Report, Jan. 12, 2009.
Krug et al., Fine Patterning of Thin Sol-gel Films, Journal of Non-Crystalline Solids 147 & 148, pp. 447-450 Jan. 1, 1992.
Resnick et al., High Resolution Templates for Step and Flash Imprint Lithography, Journal of Microlithography, Microfabrication, and Microsystems. vol. 1. No. 3. Oct. 1, 2002.
Abstract of Japanese Patent 61-040845, Feb. 27, 1986.
Thompson et al., Fabrication of Step and Flash Imprint Lithography Templates Using Commercial Mask Processes, SPIE Microlithography Conference Feb. 1, 2003.
Gehoski et al., Indium Tin Oxide Template Development for Step and Flash Imprint Lithgraphy, SPIE Microlithography Conference Feb. 1, 2005.
Dauksher et al., Repair of Step and Flash Imprint Lithography Templates, J. Vac. Sci. Technol. B 22(6), pp. 3306-3311 Nov. 1, 2004.
Resnick et al., Imprint Lithography: Lab Curiosity or the Real NGL?, SPIE Microlithography Conference Feb. 1, 2003.
Mancini et al., Analysis of Critical Dimension Uniformity for Step and Flash Imprint Lithography, SPIE Microlithography Conference Feb. 1, 2003.
Mancini et al., Hydrogen Silsesquioxane for Direct Electron-Beam Patterning of Step and Flash Imprint Lithography Templates, J. Vac. Sci. Technol. B 20(6), pp. 2896-2901 Nov. 1, 2002.
Dauksher et al., Characterization of and Imprint Results Using Indium Tin Oxide-Based Step and Flash Imprint Lithography Templates, J. Vac. Sci. Technol. B 20(6), pp. 2857-2861 Nov. 1, 2002.
Nordquist et al., Critical Dimension and Image Placement Issues for Step and Flash Imprint Lithography Templates, 22nd Annual BACUS Symposium on Photomask Technology, Monterey, CA Sep. 1, 2002.
Bailey et al., Template Fabrication Schemes for Step and Flash Imprint Lithography, Microelectronic Engineering, 61-62, pp. 461-467 Jan. 1, 2002.
Resnick et al., High Resolution Templates for Step and Flash Imprint Lithography, SPIE Microlithography Conference Feb. 1, 2002.
Resnick et al., New Methods for Fabricating Step and Flash Imprint Lithography Templates, NIST-SPIE Conference on Nanotechnology Sep. 1, 2001.
Kirby et al., In-Situ Fabrication of Dialysis Membranes in Glass Microchannels using Laser-induced Phase-Separation Polymerization, MicroTAS 2002, p. 742-744 Jan. 1, 2002.
Translation of Japanese Patent 61-40845, Feb. 1, 1986.
Bien et al., Characterization of Masking Materials for Deep Glass Micromachining, J. Micromech. Microeng. 13 pp. S34-S40 Jan. 1, 2003.
Britten et al., Multiscale, Multifuncation Diffractive Structures We Etched into Fused Silica for High-Laser Damage Threshold Applications, Applied Optics, vol. 37, No. 30 Oct. 20, 1998.
Fletcher et al., Microfabricated Silicon Solid Immersion Lens, Jounral of Microelectromechanical Systems, vol. 10, No. 3 Sep. 1, 2001.
Khandaker et al., Fabrication of Microlens Arrays by Direct Electron Beam Exposure of Photoresist, Pure Appl. Opt. 6, pp. 637-641 Jan. 1, 1997.
Kim et al., Replication Qualities and Optical Properties of UV-moulded Microlens Arrays, J. Phys. D: Appl. Phys. 36; pp. 2451-2456 Jan. 1, 2003.
Kobayashi et al., Batch Bulk-Mircomachined High-Precision Metal-On-Insulator Microspires and Their Application to Scanning Tunneling Microscopy, J. Micromech. Microeng. 14; pp. S76-S81 Jan. 1, 2004.
Konijn et al., Nanoimprint Lithography of Sub-100nm 3D Structures, Microelectronic Engineering 78-79; pp. 653-658 Jan. 1, 2005.
Kunnavakkam et al., Low-cost, Low-loss Microlens Arrays Fabricated by Soft-Lithography Replication Process, Applied Physics Letters, vol. 82, No. 8 Feb. 24, 2003.
Mansell et al., Binary-Optic Smoothing with Isotropic Etching, Applied Optics; vol. 36, No. 20 Jul. 10, 1997.
Waheed et al., Balancing Aerial Image Intensity for A

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