Method of creating a photonic via using deposition

Details Method of creating a photonic via using deposition Method of creating a photonic via using deposition

2005-03-22

2005-03-22

Chen, Kin-Chan (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Combined with coating step

C438S702000

Reexamination Certificate

active

06869882

ABSTRACT:
A photonic via is made in a substrate by making a hole in the substrate, depositing a cladding into the hole, and then depositing an optical core material into the hole. In one embodiment, a lens can be made by applying a polymer on top of the photonic via and curing.

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