Method of compensating for defective pattern generation data...

Details Method of compensating for defective pattern generation data... Method of compensating for defective pattern generation data...

2008-04-02

2009-02-24

Lin, Sun J (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000

Reexamination Certificate

active

07496885

ABSTRACT:
The present invention comprises a system, software, and method for the treatment of mask data that produces defects in resultant images produced in the fabrication of a mask, following identification of the defects. The invention involves identifying each exposure shot with certain information which when combined with similar information related to the defects is used to control the exposure tool to toggle or modulate the shots related to the defects and thus, eliminate the defects.

REFERENCES:
patent: 5386430 (1995-01-01), Yamagishi et al.
patent: 6649919 (2003-11-01), Chao et al.
patent: 7250237 (2007-07-01), Ottens et al.
patent: 7254251 (2007-08-01), Cai et al.
patent: 2006/0183025 (2006-08-01), Yang et al.
patent: 2006/0284120 (2006-12-01), Takita

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