Method of coating and imaging photopatternable silicone polyamic

Details Method of coating and imaging photopatternable silicone polyamic Method of coating and imaging photopatternable silicone polyamic

1987-04-03

1988-11-01

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430270, 430272, 430325, 156628, G03C 500

Patent

active

047820098

ABSTRACT:
Photopatternable silicone polyamic acid can be spun onto a substrate and thereafter used in combination with a photoresist as an antireflective coating or as a patterned silicone polyamide. The silicone polyamic acid can be used with an absorbing dye, or it can be tinted with an organic dye to provide color filters when applied on a transparent substrate.

REFERENCES:
patent: 3886865 (1975-06-01), Ohto et al.
patent: 4381396 (1983-04-01), Ryang
patent: 4510227 (1985-04-01), Mohr et al.
patent: 4600685 (1986-07-01), Kitakohjo et al.

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