Method of cleaning semiconductor wafers and other substrates

Details Method of cleaning semiconductor wafers and other substrates Method of cleaning semiconductor wafers and other substrates

1998-07-29

2000-11-07

Warden, Jill

Cleaning and liquid contact with solids

Processes

Using solid work treating agents

134 33, 134902, B08B 700

Patent

active

061430897

ABSTRACT:
A method and apparatus for cleaning a wafer oriented vertically is provided. The apparatus includes a first brush and a second brush located horizontally from the first brush. During use, a wafer is orientated vertically between the first and second brushes. The brushes are brought into contact with the wafer and rotated thereby engaging the wafer with rollers. By rotating the rollers, the wafer is also rotated. Liquid is sprayed towards the brushes and wafer. By orienting the wafer vertically, liquid and particulates contained therein readily fall from the wafer due to gravity. This is particularly advantageous when cleaning larger diameter wafers in which particulates must be removed from a larger wafer surface area.

REFERENCES:
patent: 4062463 (1977-12-01), Hillman et al.
patent: 4202071 (1980-05-01), Scharpf
patent: 4208760 (1980-06-01), Dexter et al.
patent: 4382308 (1983-05-01), Curcio
patent: 4569695 (1986-02-01), Yamashita et al.
patent: 5317778 (1994-06-01), Kudo et al.
patent: 5351360 (1994-10-01), Suzuki et al.
patent: 5357645 (1994-10-01), Onodera
patent: 5361449 (1994-11-01), Akimoto
patent: 5442828 (1995-08-01), Lutz
patent: 5475889 (1995-12-01), Thrasher et al.
patent: 5529638 (1996-06-01), Lutz
patent: 5555177 (1996-09-01), Simmons
patent: 5581837 (1996-12-01), Uchiyama et al.
patent: 5606251 (1997-02-01), Ryle et al.
patent: 5624501 (1997-04-01), Gill, Jr.
patent: 5639311 (1997-06-01), Holley et al.
patent: 5675856 (1997-10-01), Itzkowitz
patent: 5693148 (1997-12-01), Simmons et al.
patent: 5723019 (1998-03-01), Krussell et al.
patent: 5727332 (1998-03-01), Thrasher et al.
patent: 5745946 (1998-05-01), Thrasher et al.
patent: 5778554 (1998-07-01), Jones
patent: 5806126 (1998-09-01), De Larios et al.
patent: 5933902 (1999-08-01), Frey

Affiliated with

Also associated with

Rating

Method of cleaning semiconductor wafers and other substrates does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of cleaning semiconductor wafers and other substrates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of cleaning semiconductor wafers and other substrates will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1636862