Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2011-07-05
2011-07-05
Nhu, David (Department: 2895)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C438S347000, C438S359000, C257SE21170, C257SE21077, C257SE21218, C257SE21320, C257SE21227, C257SE21229
Reexamination Certificate
active
07973345
ABSTRACT:
A method of cleaning a patterning device, the patterning device having at least organic coating material (OLED material) deposited thereon, where the method includes the step of providing a cleaning plasma for removing the coating material from the patterning device by means of a plasma etching process. During the step of removing the coating material from the patterning device, the temperature of the patterning device does not exceed a critical temperature causing damage to the patterning device, while maintaining a plasma etching rate of at least 0.2 μm/min. In order to generate a pulsed cleaning plasma, pulsed energy is provided. The method can be carried out in a direct plasma etching process or in a remote plasma etching process. Different etching processes may be combined or carried out subsequently.
REFERENCES:
patent: 6388377 (2002-05-01), Kobayashi et al.
patent: 6872322 (2005-03-01), Chow et al.
patent: 6911667 (2005-06-01), Pichler et al.
patent: 7015154 (2006-03-01), Yamazaki et al.
patent: 7307382 (2007-12-01), Uhlig et al.
patent: 7485580 (2009-02-01), Johnson et al.
patent: 1534806 (2004-10-01), None
patent: 1549351 (2004-11-01), None
patent: 3923188 (1992-07-01), None
patent: 19643865 (1998-05-01), None
patent: 1319732 (2003-06-01), None
patent: 1715078 (2006-10-01), None
patent: 1998389 (2007-05-01), None
patent: 2000282219 (2000-10-01), None
patent: 2001203079 (2001-07-01), None
patent: 2003332052 (2003-11-01), None
patent: 2004103512 (2004-04-01), None
patent: 2005129299 (2005-05-01), None
patent: 2007007644 (2007-12-01), None
patent: 20030032415 (2003-04-01), None
patent: 10-20070032925 (2007-03-01), None
patent: 589751 (2004-06-01), None
patent: 589920 (2004-06-01), None
patent: WO 0016914 (2000-03-01), None
patent: WO 03043067 (2003-05-01), None
patent: WO 2007038427 (2007-04-01), None
S.W. Kin, Ed., “Next Generation Mass Production Line and its OLED Module,”SID Symposium Digest of Technical Papers, May 2003, vol. 34, issue 1, pp. 1414-1417, Society for Information Display, US.
X. Tang, et al., “Process-induced Damage by a Low Energy Neutral Beam Source [etching/cleaning], ”1999 4th international Symposium on Plasma Process-Induced Damage, May 9-11, 1999, pp. 116-119, American Vacuum Society, CA, US.
Dieguez-Campo Jose Manuel
Hoffmann Uwe
Applied Materials Inc.
Kilpatrick Townsend & Stockton LLP
Nhu David
LandOfFree
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