Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Patent
1998-06-01
2000-10-31
Dutton, Brian
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
438289, 257401, H01L 218234, H01L 21336, H01L 2976, H01L 2994, H01L 31062
Patent
active
061401846
ABSTRACT:
A field effect transistor (30) has an array of transistors (31) made up of bonding pads (45-47) and sub-arrays of transistors (41-43). The bonding pads (45-47) are distributed between the sub-arrays of transistors (41-43) to reduce the maximum temperature that any portion of the FET (30) is exposed to while the FET (30) is in a conducting state. A similar effect can be appreciated by adjusting the threshold voltage or pinch-off resistance of the transistors in a portion (101) of an array of transistors (95).
REFERENCES:
patent: 4918333 (1990-04-01), Anderson et al.
patent: 4924111 (1990-05-01), Anderson et al.
patent: 5003370 (1991-03-01), Kashiwagi
patent: 5365099 (1994-11-01), Phipps et al.
patent: 5895255 (1999-04-01), Tsuchiaki
Baird Robert W.
Dupuy Phillipe
Merchant Steven L.
Collopy Daniel R.
Dutton Brian
Hightower Robert F.
Motorola Inc.
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