Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1986-01-08
1987-06-09
Goodrow, John L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430308, 430324, G03C 500, G03C 172
Patent
active
046720197
DESCRIPTION:
BRIEF SUMMARY
It is desirable when manufacturing various products, to provide one or more of their surfaces with a certain characteristic such as a pattern, a rough surface or something similar. The means available for achieving these surface characteristics on products may be moulds, rollers and tools of various types. Such means are generally made of metal and have surfaces which have been deformed in order to achieve the desired features on the surfaces of the product manufactured. To achieve the desired pattern, the surfaces of the means are generally treated by means of etching. Certain areas to be left untreated are provided with a protective layer. When the etching process is complete, the protective layer is removed and the means has acquired the distinctive pattern which is to be transferred to a product. A known method of transferring protective layers to a means is the use of a film having a light-sensitive layer and a negative with the desired pattern being placed in front of the light-sensitive layer. An exposure is then effected. When exposure is complete the unexposed parts of the light-sensitive layer are removed from the film. The remaining parts of the layer have adhesive properties. Such a film is placed against the surface of a means which is to transfer the pattern to a product being manufactured. By subjecting the film to rubbing, the exposed parts of the light-sensitive layer are transferred to the surface of the means. When transfer has been completed, the film can be removed from the surface of the means, after which the surface can be subjected to etching. After etching, the surfaces of the means has the desired pattern. The drawback of this method of transferring a protective layer to the surface of a means is that difficulties may arise in obtaining satisfactory adhesion of the protective layer.
The object of the present invention is to achieve a method by which more perfect adhesion of the protective layer is obtained. This is achieved by using a screen fabric or foil with a photo-emulsion applied on one side. A pattern is transferred to the photo-emulsion by placing a negative with the desired pattern in front of the photo-emulsion. The photo-emulsion is then subjected to exposure. The screen fabric with photo-emulsion is cleaned after exposure. The exposed screen fabric is placed with its front side against a surface such as the surface of a foil. A compound is applied on the reverse side of the screen fabric, pressed through the screen fabric and thus transferred to the surface just mentioned. The compound transferred to the surface is allowed to solidify, after which the compound transferred to said surface is provided with an adhesive layer. The coated surface is then placed against the surface of the means which is to transfer the pattern produced to a product being manufactured. The surface is pressed against the surface of said means and is perfectly adhered thereto. The coating surface is then removed and the means has acquired a surface with a perfect protective layer against the etching liquid to be used in the following etching process.
A practical example with be described in more detail in the following. According to the invention a screen fabric or screen cloth is used which may be manufactured of nylon or polyester. The mesh size in the cloth shall be 20-22. Cloths of the type described are described on page B 1 of a brochure produced by Hagberg & Winholm, Stockholm. The cloth is coated with a light-sensitive layer which may consist of the following composition: a protein-based layer sensitized with ammonium bicarbonate or a pre-sensitized film, type Ulano.RTM.. Such a composition is described on page A 1 of a catalogue from Hagberg & Winholm, Stockholm. A negative plate containing the pattern to be transferred to a product is placed in front of the light-sensitive layer. When the negative is in position, the light-sensitive layer on the screen cloth is subjected to exposure. After exposure the screen cloth is developed and the desired pattern thus appears on the screen cloth
REFERENCES:
patent: 3507653 (1970-04-01), Preddy et al.
patent: 3737314 (1973-06-01), Rulett et al.
patent: 4388388 (1983-06-01), Kornbau et al.
Goodrow John L.
Svensk Industrigravyr AB
LandOfFree
Method of applying a protective layer on a surface to be subject does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of applying a protective layer on a surface to be subject, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of applying a protective layer on a surface to be subject will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1828596