Method of and apparatus for minimizing plasma instability in an

Details Method of and apparatus for minimizing plasma instability in an Method of and apparatus for minimizing plasma instability in an

1999-06-18

2000-05-09

Bettendorf, Justin P.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

324 7645, 324 7646, H05H 146

Patent

active

060608374

ABSTRACT:
Variable reactances of a matching network connected between an r.f. source and a plasma load of a vacuum plasma chamber processing a workpiece are varied so a tendency of the plasma to change in an unstable manner which can adversely affect processing of the workpiece is avoided while matching is approached. The plasma tendency to change in an unstable manner is detected by monitoring an electrical parameter resulting from r.f. current flowing between the source and load via the network. The parameter can be (1) statistically based, e.g. variance of percent delivered power, or (2) amplitude modulation in one or both of the 2-20 kHz and 50-200 kHz ranges.

REFERENCES:
patent: 5474648 (1995-12-01), Patrick et al.
patent: 5689215 (1997-11-01), Richardson et al.
patent: 5793162 (1998-08-01), Barnes et al.
patent: 5815047 (1998-09-01), Sorensen et al.
patent: 5842154 (1998-11-01), Harnett

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