Method of and apparatus for measuring film thickness

Details Method of and apparatus for measuring film thickness Method of and apparatus for measuring film thickness

1989-08-16

1991-01-15

Rosenberger, Richard A.

Optics: measuring and testing

By configuration comparison

With photosensitive film or plate

356381, 356355, 356357, G01B 1106, G01B 1102

Patent

active

049848941

ABSTRACT:
A method of and an apparatus for measuring the thickness of a first thin film which is the uppermost layer of a sample formed by two or more stacked thin films. Light is transmitted through the first thin film but absorbed by a second thin film positioned directly under the first thin film. The spectrum of light reflected by the sample is detected to obtain the thickness of the first thin film.

REFERENCES:
patent: 4352561 (1982-10-01), Tohyama et al.
patent: 4555767 (1985-11-01), Case et al.
patent: 4618262 (1986-10-01), Maydan et al.
patent: 4645349 (1987-02-01), Tabata
patent: 4676647 (1987-06-01), Kikkawa et al.
IBM Technical Disclosure Bulletin, vol. 20, No. 3, "Optical Thickness Measurement Analysis Applicable to Multilayer Films", Aug. 1979.

Affiliated with

Also associated with

Rating

Method of and apparatus for measuring film thickness does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of and apparatus for measuring film thickness, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of and apparatus for measuring film thickness will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-52198