Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1996-03-29
1999-11-09
Lee, Benny T.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
333 173, 333 32, 333 99PL, H05H 124
Patent
active
059820993
ABSTRACT:
A gas in a vacuum plasma processing chamber is ignited to a plasma by subjecting the gas to an r.f. field derived from an r.f. source having a frequency and power level sufficient to ignite the gas into the plasma and to maintain the plasma. The r.f. field is supplied to the gas by a reactive impedance element connected via a matching network to the r.f. source. The matching network includes first and second variable reactances that control loading of the source and tuning a load, including the reactive impedance element and the plasma, to the source. The value of only one of the reactances is varied until a local maximum of a function of power coupled between the source and the load is reached. The value of only the other reactance is varied until a local maximum of the function is reached. The two varying steps are then repeated as necessary.
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Barnes Michael S.
Holland John Patrick
Ngo Tuan
Richardson Brett
Lam Research Corporation
Lee Benny T.
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