Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1983-05-16
1984-06-05
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430317, 430327, 430330, 156628, 1566591, 156662, G03C 500, B44C 122
Patent
active
044528817
ABSTRACT:
The invention relates to a method of adjusting the edge angle of openings that are etched in a polysilicon layer.
The steepness of the edge angles can be adjusted by means of a treatment of the polysilicon layer prior to the making of the photoresist mask with a mixture of 5 parts water and 1 to 3 parts ammonia and 0.25 to 1 part hydrogen peroxide. This pre-treatment is advantageously carried out at a temperature between 40.degree. and 70.degree. C.
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Goessler et al., IBM Technical Disclosure Bulletin, vol. 25, No. 12, May 1983, p. 6640.
Article by E. Terner entitled "Improved FET Performance" published in IBM Technical Disclosure Bulletin, vol. 13, No. 10, Mar. 1971.
Augstein Wolfgang
Frasch Peter
Ivancic Blanka
Zuegel Markus A.
Dees Jos,e G.
International Business Machines - Corporation
Kittle John E.
Tacticos George
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