Method of acquiring offset deflection amount for shaped beam...

Details Method of acquiring offset deflection amount for shaped beam... Method of acquiring offset deflection amount for shaped beam...

2011-08-30

2011-08-30

Wells, Nikita (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

With detector

C250S3960ML, C250S492220, C250S492200, C250S492300, C700S121000

Reexamination Certificate

active

08008631

ABSTRACT:
A method of acquiring an offset deflection amount for a shaped beam, includes forming reference images of first and second figures which can be shaped by first and second aperture plates placed on a lithography apparatus, and a reference image of a mark; forming first and second convolution reference images based on the reference images of the mark and of the first and second figures; scanning over the mark with charged particle beams shaped into the first and second figures to acquire optical images of the first and second figures; forming first and second convolution synthesis images based on the first convolution reference image and respectively the optical images of the first and second figures; and calculating an offset deflection amount for the charged particle beam shaped into the second figure to match reference positions of the first and second figures based on center-of-gravity positions of the first and second convolution synthesis images.

REFERENCES:
patent: 5124927 (1992-06-01), Hopewell et al.
patent: 7679068 (2010-03-01), Kamikubo et al.
patent: 2010/0175042 (2010-07-01), Tirapu Azpiroz et al.
patent: 6-124883 (1994-05-01), None
patent: 9-35057 (1997-02-01), None

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