Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
Reexamination Certificate
2006-06-23
2008-10-07
Nhu, David (Department: 2818)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
By reaction with substrate
C438S513000, C438S680000, C257SE21170, C257SE21245, C257SE21311, C257SE39006, C257SE51038, C257SE51040
Reexamination Certificate
active
07432217
ABSTRACT:
In a method of achieving uniform lengths of Carbon NanoTubes (CNTs) and a method of manufacturing a Field Emission Device (FED) using such CNTs, an organic film is coated to cover CNTs formed on a predetermined material layer. The organic film is etched to a predetermined depth to remove projected portions of the CNTs. After that, the organic film is removed.
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Han In-Taek
Kim Ha-Jin
Bushnell , Esq. Robert E.
Nhu David
Samsung SDI & Co., Ltd.
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