Method for via etching in organo-silica-glass

Details Method for via etching in organo-silica-glass Method for via etching in organo-silica-glass

2005-07-05

2005-07-05

Deo, Duy-Vu N. (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Combined with coating step

C438S706000, C438S714000, C438S725000

Reexamination Certificate

active

06914004

ABSTRACT:
According to one embodiment of the invention, a method for via etching in a dielectric material includes providing a wafer (200) having a substrate (202), an etch stop layer (210) disposed outwardly from the substrate, an Organo-Silica-Glass layer (212) disposed outwardly from the etch stop layer (210), and a photoresist layer (216) disposed outwardly from the Organo-Silica-Glass layer (212), and positioning the wafer (200) within a process chamber (114). The method further includes introducing a first source gas mixture (110) into the process chamber (114) to etch a first portion of the Organo-Silica-Glass layer (212) utilizing the first source gas mixture (110), and introducing a second source gas mixture (110) into the process chamber (114) to etch, for a predetermined time period, a second portion of the Organo-Silica-Glass layer (212) down to the etch stop layer (210). The second source gas mixture (110) includes a fluorocarbon, a noble gas, carbon monoxide, and nitrogen.

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