Method for transferring patterns on silicone ladder type resin a

Details Method for transferring patterns on silicone ladder type resin a Method for transferring patterns on silicone ladder type resin a

1990-02-05

1992-02-11

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430162, 430272, 430330, 430313, 430317, 430328, G03F 730, G03F 740

Patent

active

050875531

ABSTRACT:
A method for transferring patterns on a silicone ladder type resin, which comprises: applying onto a substrate a silicone ladder type resin to be represented by the following general formula (I) ##STR1## (where: R.sub.1 denotes a phenyl group or a lower alkyl group, and two R.sub.1 's may be the same or different kinds; R.sub.2 denotes hydrogen atom or a lower alkyl group, and four R.sub.2 's may be the same or different kinds; and n represents an integer of from 5 to 1,000); drying the thus applied resin layer; thereafter applying onto the resin layer a cresol novolac type positive photo-resist; forming a predetermined pattern in the photo-resist layer; subjecting the photo-resist layer to pretreatment; and finally etching the silicone ladder type resin.
An etching liquid for etching a silicone ladder type resin, which comprises an aromatic type solvent.

REFERENCES:
patent: 4738916 (1988-04-01), Namatsu et al.
W. S. DeForest, Photoresist: Materials and Processes, McGraw-Hill Book Co., New York, NY, 1975, pp. 55-61, 132-162, 244-246.
Walter Noll, Chemistry and Technology of Silicones, Academic Press, 1968, pp. 470-471 and 483-484.

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