Method for toolmatching and troubleshooting a plasma...

Details Method for toolmatching and troubleshooting a plasma... Method for toolmatching and troubleshooting a plasma...

2005-03-29

2005-03-29

Vo, Tuyet T. (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C315S111410, C333S017300, C118S050100

Reexamination Certificate

active

06873114

ABSTRACT:
A method tests a plasma processing system having a chamber, an RF power source, and a matching network. An RF power signal is generated from the RF power source to the chamber without igniting any plasma within the chamber. The voltage of the RF power signal, the current of the RF power signal, and the phase of the RF power signal, received by the chamber is measured while holding other parameters affecting the chamber constant. A value representative of an impedance of the chamber is computed based on the voltage, the current, and the phase. The value is then compared with a reference value to determine any defects in the plasma processing system. The reference value is representative of the impedance of a defect-free chamber.

REFERENCES:
patent: 5565737 (1996-10-01), Keane
patent: 5939886 (1999-08-01), Turner et al.
patent: 20030178140 (2003-09-01), Hanazaki et al.
SmartPIM with ImPrint—A Better, Faster Way to Fault Detection and Classification (FDC), 2001 Scientific Systems, 4 pages.

Affiliated with

Also associated with

Rating

Method for toolmatching and troubleshooting a plasma... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for toolmatching and troubleshooting a plasma..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for toolmatching and troubleshooting a plasma... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3378885