Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1994-02-28
1995-11-21
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430311, 430325, 430328, 430394, 430494, 430942, 2504923, G03F 720, G03C 500, H01L 2130
Patent
active
054685958
ABSTRACT:
An electron beam exposure method for controlling the solubility of resist layers used in a variety of lithography processes, to permit removal of the resist material from selected positions and depths in the resist. By controlling the energy of a uniform electron beam impinging on the resist, the method selects a resist depth for applying a dose of electrons, the effect of which is to change the solubility properties of the resist material at the selected positions and depths. Subsequent removal of unwanted portions of the resist produces desired resist wall slope and edge profiles in the developed patterns in photoresist. One embodiment of the invention uses the same basic method to produce three-dimensional structures in the resist material, including bridge-like structures in which lower layers are removed from beneath intact upper layers. In a variant of this embodiment, the same technique is used to form a three-dimensional mold in the resist material, and then three-dimensional structures of another material, such as metal are formed by filling the mold.
REFERENCES:
patent: 3615454 (1971-10-01), Cescon
patent: 4702995 (1987-10-01), Okada
patent: 4814244 (1989-03-01), Koguchi
Duda Kathleen
Electron Vision Corporation
Heal Noel F.
LandOfFree
Method for three-dimensional control of solubility properties of does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for three-dimensional control of solubility properties of, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for three-dimensional control of solubility properties of will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1136011