Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate
2007-10-30
2007-10-30
Barr, Michael (Department: 1746)
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
C134S001300, C134S019000, C156S345510
Reexamination Certificate
active
11128022
ABSTRACT:
A method for cleaning a semiconductor structure including providing a chamber for holding the semiconductor structure and a dense phase fluid, providing a thermal transfer device having a thermal transfer surface, connecting the thermal transfer device to the chamber, placing the semiconductor structure in the chamber in contact with the thermal transfer surface and thermally cycling the thermal transfer surface.
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Cotte John M.
Goldfarb Dario
McCullough Kenneth J.
Moreau Wayne M.
Pope Keith R.
Barr Michael
Chaudhry Saeed T.
International Business Machines - Corporation
Morris, Esq. Daniel P.
Perman & Green LLP
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