Method for the production of structured layers on substrates

Details Method for the production of structured layers on substrates Method for the production of structured layers on substrates

2003-04-15

2010-11-02

Fourson, George (Department: 2823)

Semiconductor device manufacturing: process

Chemical etching

Combined with coating step

C438S780000, C438S778000, C257SE21245, C257SE21244

Reexamination Certificate

active

07825029

ABSTRACT:
A method for the patterned coating of a substrate with at least one surface is provided. The method is suitable for the rapid and inexpensive production of precise patterns. The method includes the steps of: producing at least one negatively patterned first coating on the at least one surface, depositing at least one second layer, which includes a material with a vitreous structure, on the surface, and at least partially removing the first coating.

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