Method for the production of a micromechanical device,...

Details Method for the production of a micromechanical device,... Method for the production of a micromechanical device,...

2007-08-28

2007-08-28

Ahmed, Shamim (Department: 1765)

Etching a substrate: processes

Etching of semiconductor material to produce an article...

C216S058000, C216S067000, C438S706000, C438S710000, C438S733000, C438S737000

Reexamination Certificate

active

10522694

ABSTRACT:
A method for producing a micromechanical device, e.g., a micromechanical oscillating mirror device, is provided. It is provided, starting from the front side of an SOI/EOI(epipoly on insulator) substrate, to penetrate to the desired depth of the silicon substrate layer in two successive, separate deep etching steps, and to use this in its upper region that is close to the oxide layer as sacrificial layer for vertically exposing the island structures that are positioned above the oxide layer in the functional layer. The method according to the present invention of a sacrificial layer process for generating large vertical deflections utilizes purely surface micromechanical process steps.

REFERENCES:
patent: 5198390 (1993-03-01), MacDonald et al.
patent: 5876879 (1999-03-01), Kleinhenz et al.
patent: 6388300 (2002-05-01), Kano et al.
patent: 6653221 (2003-11-01), Subramanian et al.
patent: 6759340 (2004-07-01), Nallan et al.
patent: 7052623 (2006-05-01), Becker et al.
patent: 7083997 (2006-08-01), Brosnihhan et al.
patent: 2002/0066924 (2002-06-01), Blanchard
patent: 40 00 496 (1991-02-01), None
patent: 42 41 045 (1994-05-01), None
patent: 197 57 197 (1999-06-01), None
patent: 198 47 455 (2000-04-01), None
patent: WO96 08036 (1996-03-01), None
patent: WO97 15066 (1997-04-01), None
patent: WO 02 12116 (2002-02-01), None

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