Method for the preparation of relief structures

Details Method for the preparation of relief structures Method for the preparation of relief structures

1978-12-22

1980-01-08

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430283, 430284, 430306, 430313, 20415914, 20415919, G03C 500

Patent

active

RE0301868

ABSTRACT:
The invention provides a method for the preparation of relief structures of highly heat-resistant polymers, using radiation-sensitive, soluble preliminary polymers in the form of polyaddition or polycondensation products of polyfunctional carbocyclic or heterocyclic compounds containing radiation-sensitive radicals in ester groups bound to said compounds with diamines, diisocyanates, bis-acid chlorides or dicarboxylic acids of cyclic structure. According to the invention, the polyfunctional compounds containing the radiation-sensitive radicals contain, besides carboxyl, carboxylic acid chloride, amino, isocyanate or hydroxyl groups suitable for addition or condensation reactions, partly in ortho or periposition thereto, radiation-reactive radicals in the ester groups bound to the compounds having an oxyalkylene methacrylate or acrylate structure.

REFERENCES:
patent: 3475176 (1969-10-01), Rauner
patent: 3650746 (1972-03-01), Bailey
patent: 3753720 (1973-08-01), Kloczewski et al.
patent: 3801638 (1974-04-01), Cerwonka
patent: 3847767 (1974-11-01), Kloczewski
patent: 3858510 (1975-01-01), Kai et al.
patent: 3957512 (1976-05-01), Kleeberg et al.

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