Method for the optimum utilization of base material in the manuf

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging

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430 5, 385 37, G03C 500, G02B 634

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058341587

ABSTRACT:
Disclosed is a method for the optimum utilization of disk-shaped base material in the manufacture of optoelectronic components with variable-period grating. The method helps avoid material losses by arranging optoelectronic components on a disk-shaped base material in an optimum manner and is based on obtaining variants of nominally identical individual component patterns by mathematical rotation and mirroring, forming a unit cell through shifting of the individual component pattern variants, and reproducing the unit cell in the x and y directions until the active surface of the mask or the entire surface of the disk-shaped base material is tightly covered. The method may be used for the manufacture of photonic components based on DFB, DBR, or sampled grating structures.

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