X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1992-02-13
1994-12-13
Dzierzynski, Paul M.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
364472, 364507, G01N 2320
Patent
active
053735455
ABSTRACT:
The process measures a characteristic (X) which is difficult to measure of a continuously produced product and comprises:
REFERENCES:
patent: 3869892 (1975-03-01), Higham et al.
patent: 3956631 (1976-05-01), Crosby, Jr.
patent: 4073007 (1978-02-01), Boivin
patent: 5308010 (1994-05-01), Hakiel
Patent Abstracts of Japan, vol. 5, No. 21 (P-48) [693], Feb. 7, 1981, & JP-A 55-149031, Nov. 20, 1980, S. Shida, et al., "Shape Detecting Method of Rolled Plate".
Materiaux Et Techniques, Sep.-Oct. 1988, Paris, FR, pp. 5-12, G. Maeder, "Developpements Actuels De La Determination Des Contraintes Par Diffraction Des Rayons X".
Friedrich Marc
Lebrun Jean-Lou
Marez Jean-Jacques
Michaud Herve Pierre
Bruce David V.
Dzierzynski Paul M.
Sollac
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