Etching a substrate: processes – Etching of semiconductor material to produce an article...
Patent
1997-01-22
1999-07-13
Ford, John M.
Etching a substrate: processes
Etching of semiconductor material to produce an article...
216 28, 427255, 427309, C30B 2906, C30B 3302, C04B 4100
Patent
active
059222131
DESCRIPTION:
BRIEF SUMMARY
TECHNICAL FIELD
This invention is to provide ornamental silicon articles having colorfulness, durability, novelty and applicability by treating a monocrystalline or a polycrystalline body of silicon, which is mirror-finished or not mirror-finished, according to the method of the invention thereby forming an oxidized film onto the silicon.
BACKGROUND TECHNOLOGY
As substitutes for pearls, noble metals and jewels there are conventionally known such as those in which the surfaces of base metals are colored or plated with other materials or synthetic resins are colored. Particularly, these days, materials manufactured in the field of high technology, such as mirror silicon plates, are used for ornamental parts of tiepins.
In the case of metals or silicon problems do not take occur if the unvarnished materials themselves are used, but if colored materials are used the coloring agent is likely to released thereby presenting a problem for durability. Further, as new jewel imitation it was difficult to obtain it having excellent ornamental properties such as in color, profoundness in color, durability, and gloss and shine. As ornamental silicon articles there are known such ones that in processing silicon as ornamental articles the surface of silicon is provided with an oxidized layer (Patent Kokai No. 3-39102) or with a silicon compound layer permeable but inert to visible rays (Patent Kokai No. 60-13599).
DISCLOSURE OF THE INVENTION
The present invention provides a method for the menufacture of silicon for ornamental articles having excellent ornamental properties by coloring the surface of silicon without using coloring agents. The method is characterized in that a starting material possessing a mirror-finished surface of silicon is pre-treated being brought into contact with a solution of hydrofluoric acid, NH cleansed with a solution of NH.sub.4 OH:H.sub.2 O.sub.2 base or NH.sub.4 OH:H.sub.2 O.sub.2 base and then filmed by oxidation, or the non-mirror-finished surface of silicon is pre-treated being brought into contact with a solution of hydrofluoric acid, subjected to an alkali etching with a solution of KOH:H.sub.2 O then NH cleansed, and finally filmed by oxidation. In the present method it will also be satisfactory that the silicon for ornamental articles is processed to its final shape and thereafter it is filmed by oxidation.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1(a) is a sectional view of a spherical silicon piece manufactured according to the method of the present invention;
FIG. 1(b) is a sectional view of an oval silicon piece;
FIG. 2(a) is a perspective view of a plate-shaped silicon piece manufactured according to the present method;
FIG. 2(b) is a perspective view of the profile where one angular portion of the two ends of a plate-shaped silicon piece is formed with "R";
FIG. 3 is a side view of an ornamental silicon article where the present method is applied to a brilliant cut of diamond type;
FIGS. 4(a) to 4(f) are views illustrating processing examples of ornamental silicon articles according to the present method;
FIGS. 5(a) to 5(c) are sectional views of respective processes of different examples of ornamental silicon articles according to the present method;
FIGS. 6(a) to 6(c) are sectional views of respective processes of further different examples of ornamental silicon articles according to the present method;
FIG. 7(a) to 7(c) are views illustrating applied examples of ornamental silicon articles manufactured according to the present method;
FIGS. 8(a) and 8(b) are views illustrating the coloring principle of one example of an ornamental silicon article according to the present method;
FIGS. 9(a) and 9(b) are respectively an upper surface view and a side view, illustrating an example of an ornamental silicon article having curved faces and cut portions; and
FIGS. 10(a) to 10(g) are examples where the spherical silicon piece shown in FIG. 1(a) is applied with various processings.
THE BEST MODE FOR CARRYING OUT THE INVENTION
It is conventionally known that owing to the pres
REFERENCES:
patent: 4055458 (1977-10-01), Niederprum et al.
patent: 5409569 (1995-04-01), Seki et al.
patent: 5677783 (1997-10-01), Bloom et al.
Fujinuki Kenzo
Imai Itaru
Kumagai Hideo
Ford John M.
Komatsu Electronic Metals Co. Ltd.
Sripada Pavanaram K
LandOfFree
Method for the manufacture of ornamental silicon articles does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for the manufacture of ornamental silicon articles, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for the manufacture of ornamental silicon articles will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2272883