Method for reversing tone or polarity of pattern on integrated c

Details Method for reversing tone or polarity of pattern on integrated c Method for reversing tone or polarity of pattern on integrated c

1989-03-07

1990-11-27

Dees, Jose

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430314, 430317, 430324, 430329, G03C 500

Patent

active

049735446

ABSTRACT:
The tone or polarity of a patterned layer such as a photoresist mask on an integrated circuit or device substrate is reversed with substantially perfect alignment. A liquid planarizing layer is formed and hardened onto the patterned layer and underlying substrate, filling in spaces between pattern areas. The planarizing layer is then etched to a sufficient depth to expose the patterned layer. Finally, the patterned layer is dissolved away, leaving the reversed tone image which is constituted by the planarizing material in the spaces which were filled in. Modified embodiments enable large spaces between original pattern areas to be effectively reversed, and multi-level reversed tone images to be formed in which the reversed tone layers are thicker than the original layers.

REFERENCES:
patent: 4076860 (1978-02-01), Kuroda
patent: 4307180 (1981-12-01), Pogge
patent: 4689113 (1987-08-01), Balasubramanyam

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