Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1978-06-05
1980-05-06
Kimlin, Edward C.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
151 1, 156626, 156627, 156643, 156345, 156646, 1566591, 3151112, 427 40, 427 41, 430494, G03C 500, C23F 102
Patent
active
042015790
ABSTRACT:
A method for removing photoresist from a substrate. A substrate to be stripped of photoresist is placed in a metal substrate holder or boat which is subsequently loaded into a plasma reactor. The holder is placed in contact with one electrode of the plasma reactor. The plasma reactor is evacuated and a hydrogen bearing gas is injected into the reactor at a rate to maintain the pressure between 0.1 and 10 Torr. The photoresist coated substrate is heated to a temperature between 100.degree. C. and 225.degree. C. Power is applied to the plasma reactor to create a hydrogen plasma which reacts with and removes the photoresist. During the removal operation the reflected power from the reactor is monitored to detect the end point of the plasma-photoresist reaction.
REFERENCES:
patent: 3705055 (1972-12-01), Christensen et al.
patent: 3837856 (1974-09-01), Irving et al.
patent: 3890176 (1975-06-01), Bolon
patent: 4115184 (1978-09-01), Poulsen
patent: 4134817 (1978-01-01), Bourdon
patent: 4142107 (1979-02-01), Hatzakis et al.
Robinson Frederick J.
Tracy Clarence J.
Fisher John A.
Kimlin Edward C.
Motorola Inc.
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