Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Removal of imaged layers
Patent
1997-09-12
1999-09-14
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Removal of imaged layers
134 13, G03F 742
Patent
active
059521570
ABSTRACT:
This invention concerns a method for the removal of a resist film containing phosphorus (P) or boron (B) or other inorganic element. Specifically, a resist film 42 formed on a substrate 41 is exposed to the with the acid and, consequently, is enabled to be removed from the substrate 41.
REFERENCES:
patent: 4430182 (1984-02-01), Hishida
patent: 4544416 (1985-10-01), Meador
Kato Toshio
Tokumasu Noboru
Canon Sales Co., Inc.
Duda Kathleen
Semiconductor Process Laboratory Co.
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