Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1989-01-13
1990-10-16
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20429808, 20419213, C23C 1454
Patent
active
049632388
ABSTRACT:
Techniques for removing an electrical short caused by a flake in a thin film sputtering system are disclosed. The flake typically bridges the dark space between target and anode or shield and is removed through manipulation of the power supply utilized for normal operations. Sensing of the flake and discrimination between recoverable arcs is accomplished by timing the duration of an over-current condition. Removal involves switching between power mode or some other initial mode of regulation and current modes and progressively increasing current to melt the flake. Circuitry automatically removes the flake and is easily adapted to power supplies particularly more sophisticated, high frequency, lower energy storage DC supplies.
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Harpold John G.
Schatz Douglas S.
Siefkes Jerry D.
Santangelo Luke
Weisstuch Aaron
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