Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2011-01-11
2011-01-11
Berman, Jack I (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S492100, C250S50400H
Reexamination Certificate
active
07868304
ABSTRACT:
A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.
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Bakker Levinus Pieter
Banine Vadim Yevgenyevich
Brom Paul Peter Anna Antonius
Franken Johannes Christiaan Leonardus
Moors Johannes Hubertus Josephina
ASML Netherlands B.V.
Berman Jack I
Pillsbury Winthrop Shaw & Pittman LLP
Smyth Andrew
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