Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2007-06-04
2009-12-08
Le, Dung A. (Department: 2818)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S637000, C438S700000, C438S622000, C438S508000
Reexamination Certificate
active
07629255
ABSTRACT:
A method for etching features of different aspect ratios in a conductive layer is provided. The method comprises: depositing over the conductive layer with an aspect ratio dependent deposition; etching features into the conductive layer with an aspect ratio dependent etching of the conductive layer; and repeating the depositing and the etching at least once.
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Fu Qian
Lee Wonchul
Liu Shenjian
Pu Bryan
Beyer Law Group LLP
Lam Research Corporation
Le Dung A.
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