Method for providing a pattern-wise photoresist layer on a subst

Details Method for providing a pattern-wise photoresist layer on a subst Method for providing a pattern-wise photoresist layer on a subst

1984-05-29

1985-12-10

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430269, 430271, 430326, 430325, 430510, G03C 544, G03C 1727

Patent

active

045579962

ABSTRACT:
The invention provides an improved method for the so-called dry-film process for forming a pattern-wise photoresist layer on the substrate surface in which a substrate is overlaid and laminated with a preformed film of a photosensitive composition called a dry film and photolithographically processed. In the inventive method, different from conventional dry-film processes, the substrate plate is first provided with a protecting layer of a photosensitive composition containing a halation inhibitor and the lamination with a dry film is performed without removing the protecting layer. After pattern-wise exposure to light, development of the photosensitive layer is undertaken by use of a developer solvent capable of dissolving both of the protecting layer and the pattern-forming layer. Despite the intervention of the protecting layer, the resolving power and image reproducibility are excellent.

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patent: 4434217 (1984-02-01), Master et al.

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