Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Physical stress responsive
Reexamination Certificate
2005-03-15
2005-03-15
Kielin, Erik (Department: 2813)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Physical stress responsive
C438S053000, C257S254000, C257S417000
Reexamination Certificate
active
06867061
ABSTRACT:
A method is described for producing surface micromechanical structures having a high aspect ratio, a sacrificial layer being provided between a substrate and a function layer, trenches being provided by a plasma etching process in the function layer, at least some of these trenches exposing surface regions of the sacrificial layer. To increase the aspect ratio of the trenches, an additional layer is deposited on the side walls of the trenches in at least some sections, but not on the exposed surface regions of the sacrificial layer. In addition, a sensor is described, in particular an acceleration sensor or a rotational rate sensor.
REFERENCES:
patent: 5756901 (1998-05-01), Kurle et al.
patent: 44 20 962 (1995-12-01), None
patent: 42 41 045 (1996-03-01), None
patent: 195 37 814 (1998-05-01), None
patent: 198 47 455 (2000-04-01), None
patent: 2290413 (1995-12-01), None
patent: 06 163872 (1994-06-01), None
patent: WO 94 18697 (1994-08-01), None
patent: WO 96 08036 (1996-03-01), None
Fischer Frank
Frey Wilhelm
Metzger Lars
Kenyon & Kenyon
Kielin Erik
Robert & Bosch GmbH
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