Method for producing negative resist images

Details Method for producing negative resist images Method for producing negative resist images

1981-10-28

1985-04-02

Louie, Won H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430325, 430328, 430330, 430311, 430327, G03C 500

Patent

active

045088136

ABSTRACT:
A method for producing a negative resist image is disclosed, which method comprises exposing a film of a diazo-type resist material, which is free from 1-hydroxyethyl-2-alkylimidazoline, to electron beam radiation in a predetermined pattern, heat treating said patternwise exposed resist film, subjecting said heat treated film to overall exposure to ultraviolet radiation and, then, developing the so treated film to remove the resist material in the area not exposed to electron beam radiation.

REFERENCES:
patent: 3264104 (1966-08-01), Reichel
patent: 3890152 (1975-06-01), Ruckert et al.
patent: 4104070 (1978-08-01), Moritz

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