Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1996-09-20
1998-05-12
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
118 501, 118718, 118723R, 118723VE, 427131, 427249, 4272552, 4273982, 427490, 427577, 427585, H05H 124
Patent
active
057502099
ABSTRACT:
There are disclosed method and apparatus for producing a magnetic recording medium including a non-magnetic substrate, a magnetic layer formed on one surface of said non-magnetic substrate and a back coat layer formed on an opposite surface of said non-magnetic substrate. By using the method and the apparatus, the magnetic recording medium having the back coat layer, which exhibits a high lubricating property and a low dynamic friction coefficient, can be produced with a high operating efficiency. The method includes the steps of forming the back coat layer by a plasma chemical vapor deposition and supplying a lubricant, substantially at the time when the back coat layer is formed by the plasma chemical vapor deposition, such that the lubricant is introduced into the back coat layer.
REFERENCES:
patent: 4135031 (1979-01-01), Akashi et al.
patent: 5104756 (1992-04-01), Fukuda et al.
patent: 5322716 (1994-06-01), Takahashi et al.
patent: 5488528 (1996-01-01), Chen et al.
Pianalto Bernard
Sony Corporation
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