Method for producing a semiconductor component

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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Details

C438S164000, C438S217000, C438S270000, C257SE21058, C257SE21410, C257SE21633

Reexamination Certificate

active

08003456

ABSTRACT:
A method for producing a semiconductor component is proposed. The method includes providing a semiconductor body having a first surface; forming a mask on the first surface, wherein the mask has openings for defining respective positions of trenches; producing the trenches in the semiconductor body using the mask, wherein mesa structures remain between adjacent trenches; introducing a first dopant of a first conduction type using the mask into the bottoms of the trenches; carrying out a first thermal step; introducing a second dopant of a second conduction type, which is complementary to the first conduction type, at least into the bottoms of the trenches; and carrying out a second thermal step.

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Laska, T. et al.; “Field Stop IGBTs with Dynamic Clamping Capability—A New Degree of Freedom for Future Inverter Designs?”; EPE 2005—Dresden—ISBN: 90-75815-08-5, pp. 1-8.

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