Method for preparing polysilane pattern-bearing substrate

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

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430297, 430325, G03F 730

Patent

active

061106518

ABSTRACT:
A polysilane pattern-bearing substrate is prepared by the steps of (1) forming a polysilane film on a substrate, (2) subjecting the polysilane film to selective light exposure in the presence of a first solvent which does not dissolve polysilane, but dissolves siloxane, for converting the polysilane in selected areas to siloxane for thereby forming a pattern, (3) removing only the siloxane from the substrate of step (2) using a second solvent which does not dissolve polysilane, but dissolves siloxane, and (4) completely removing the second solvent. The polysilane pattern has a high degree of definition.

REFERENCES:
patent: 4587205 (1986-05-01), Harrah
patent: 5082872 (1992-01-01), Burns
patent: 5254439 (1993-10-01), Tani
patent: 6015596 (2000-01-01), Miwa
Abstract, JP-A 4-31864.
Patent Abstracts of Japan, 06291273 A.
Patent Abstracts of Japan, 07114188 A.

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