Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1998-12-10
2000-08-29
Gibson, Sharon
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430297, 430325, G03F 730
Patent
active
061106518
ABSTRACT:
A polysilane pattern-bearing substrate is prepared by the steps of (1) forming a polysilane film on a substrate, (2) subjecting the polysilane film to selective light exposure in the presence of a first solvent which does not dissolve polysilane, but dissolves siloxane, for converting the polysilane in selected areas to siloxane for thereby forming a pattern, (3) removing only the siloxane from the substrate of step (2) using a second solvent which does not dissolve polysilane, but dissolves siloxane, and (4) completely removing the second solvent. The polysilane pattern has a high degree of definition.
REFERENCES:
patent: 4587205 (1986-05-01), Harrah
patent: 5082872 (1992-01-01), Burns
patent: 5254439 (1993-10-01), Tani
patent: 6015596 (2000-01-01), Miwa
Abstract, JP-A 4-31864.
Patent Abstracts of Japan, 06291273 A.
Patent Abstracts of Japan, 07114188 A.
Fukushima Motoo
Mori Shigeru
Barreca Nicole
Gibson Sharon
Shin-Etsu Chemical Co. , Ltd.
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