Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2011-06-28
2011-06-28
Nguyen, Nam X (Department: 1724)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192120, C204S192130, C204S192150
Reexamination Certificate
active
07967957
ABSTRACT:
For forming alumina films on substrates by sputtering of an aluminum metal target in an oxidizing gas-containing atmosphere, a method of producing α crystal structure-based alumina films efficiently includes as an early film formation, forming films under conditions suited for formation of α crystal structure alumina. For example the forming forms films of αcrystal structure alumina in a poisoning mode discharge condition only in an early stage of film formation.
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Ikari Yoshimitsu
Kohara Toshimitsu
Tamagaki Hiroshi
(Kobe Steel, Ltd.)
Berman Jason M
Nguyen Nam X
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
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