Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate
2004-09-23
2009-10-06
Everhart, Caridad M (Department: 2895)
Semiconductor device manufacturing: process
Chemical etching
Combined with coating step
C438S725000, C438S958000, C257SE21026, C257SE21027
Reexamination Certificate
active
07598176
ABSTRACT:
A plasma processing operation uses a gas mixture of N2and H2to both remove a photoresist film and treat a low-k dielectric material. The plasma processing operation prevents degradation of the low-k material by forming a protective layer on the low-k dielectric material. Carbon from the photoresist layer is activated and caused to complex with the low-k dielectric, maintaining a suitably high carbon content and a suitably low dielectric constant. The plasma processing operation uses a gas mixture with H2constituting at least 10%, by volume, of the gas mixture.
REFERENCES:
patent: 5900163 (1999-05-01), Yi et al.
patent: 6030901 (2000-02-01), Hopper et al.
patent: 6235453 (2001-05-01), You et al.
patent: 6316354 (2001-11-01), Hu
patent: 6346490 (2002-02-01), Catabay et al.
patent: 6426304 (2002-07-01), Chien et al.
patent: 6436808 (2002-08-01), Ngo et al.
patent: 6465372 (2002-10-01), Xia et al.
patent: 6528432 (2003-03-01), Ngo et al.
patent: 6562700 (2003-05-01), Gu et al.
patent: 6583047 (2003-06-01), Daniels et al.
patent: 6638875 (2003-10-01), Han et al.
patent: 6824699 (2004-11-01), Dobson
patent: 6846749 (2005-01-01), Gabriel et al.
patent: 2002/0110992 (2002-08-01), Ho
patent: 2004/0087169 (2004-05-01), Seta et al.
patent: 2005/0077629 (2005-04-01), Dalton et al.
patent: 2007/0193602 (2007-08-01), Savas et al.
Hsu Peng-Fu
Ko Chung-Chi
Shieh Jyu-Horng
Su Yi-Nien
Tao Hun-Jan
Duane Morris LLP
Everhart Caridad M
Taiwan Semiconductor Manufacturing Co. Ltd.
LandOfFree
Method for photoresist stripping and treatment of low-k... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for photoresist stripping and treatment of low-k..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for photoresist stripping and treatment of low-k... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4081625