Method for patterning film and method for exposing resist film

Details Method for patterning film and method for exposing resist film Method for patterning film and method for exposing resist film

1998-02-03

2000-04-11

Gibson, Sharon

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430313, 430327, 430942, 2504923, G03C 500

Patent

active

060486686

ABSTRACT:
Patterning a film by accumulating a first electric charge in a first area of a film under treatment, applying a resist to the film, and subsequently exposing a second area of the resist adjoining the first area to the first electric charge.

REFERENCES:
patent: 4702993 (1987-10-01), White et al.
patent: 4976818 (1990-12-01), Hashimoto et al.

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