Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1988-12-30
1990-07-10
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430280, 430945, G03C 500
Patent
active
049406515
ABSTRACT:
Cationic curable photoresists are patterned by exposing such to a laser beam in a pattern, followed by developing.
REFERENCES:
patent: 4058401 (1977-11-01), Crivello
patent: 4081276 (1978-03-01), Crivello
patent: 4224369 (1980-09-01), Borden et al.
patent: 4256828 (1981-03-01), Smith
patent: 4442197 (1984-04-01), Crivello
patent: 4508749 (1985-04-01), Brannon et al.
patent: 4592975 (1986-06-01), Young et al.
patent: 4610947 (1986-09-01), Ahne
patent: 4619894 (1986-10-01), Bozler et al.
patent: 4632898 (1986-12-01), Fister et al.
patent: 4684671 (1987-08-01), Tsuchiya et al.
patent: 4708925 (1987-11-01), Newman
patent: 4839261 (1989-06-01), Nakazaki et al.
Brown Lawrence M.
Gelorme Jeffrey D.
Kuczynski Joseph P.
Lawrence William H.
Brammer Jack P.
International Business Machines - Corporation
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