Method for patterning an insulator film and installing a groundi

Details Method for patterning an insulator film and installing a groundi Method for patterning an insulator film and installing a groundi

1998-11-13

2000-05-30

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

G03C 500

Patent

active

060689641

ABSTRACT:
A process for patterning an insulator film formed on a semiconductor substrate forms contact holes in the insulator film and also exposes a portion of the semiconductor substrate. The exposed portion is used for grounding the substrate during an electron beam irradiation step to an overlying insulator film for preventing the charge-up of the interface between the insulator film and the substrate.

REFERENCES:
patent: 5091285 (1992-02-01), Watanabe et al.
patent: 5288368 (1994-02-01), De Marco et al.

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