Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Electrical signal parameter measurement system
Reexamination Certificate
2009-01-16
2010-12-07
Tsai, Carol S (Department: 2857)
Data processing: measuring, calibrating, or testing
Measurement system in a specific environment
Electrical signal parameter measurement system
C702S118000, C156S345240, C216S059000, C216S061000, C700S108000, C700S110000, C700S121000, C438S008000, C438S009000, C118S712000, C118S7230ER, C118S7230FE, C361S234000
Reexamination Certificate
active
07848898
ABSTRACT:
Methods for monitoring process drift using plasma characteristics are provided. In one embodiment, a method for monitoring process drift using plasma characteristics includes obtaining metrics of current and voltage information of a first waveform coupled to a plasma during a plasma process formed on a substrate, obtaining metrics of current and voltage information of a second waveform coupled to the plasma during the plasma process formed on the substrate, the first and second waveforms having different frequencies, determining at least one characteristic of the plasma using the metrics obtained from each different frequency waveform, and adjusting the plasma process in response to the determined at least one characteristic of the plasma.
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Hoffman Daniel J.
Mawari Tarreg
Pender Jeremiah T. P.
Shannon Steven C.
Applied Materials Inc.
Patterson & Sheridan LLP
Tsai Carol S
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