Method for monitoring microhole growth during production of micr

Details Method for monitoring microhole growth during production of micr Method for monitoring microhole growth during production of micr

1986-11-20

1988-02-16

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156627, 156628, 156643, 156644, 156654, 156668, 2504921, B44C 122, C03C 1500, C03C 2506, B29C 3700

Patent

active

047253320

ABSTRACT:
In a method for producing a substrate with microholes having a predetermined diameter, a test region on the substrate is irradiated with a significantly higher dosage of heavy ions than the rest of the substrate. During the development of the nuclear traces by etching, the surface of the substrate in the test region abruptly changes at a certain porosity. This macroscopically observable process is then utilized to interrupt the etching process after a precisely defined time, which is calibrated to provide microholes having a predetermined diameter on the remainder of the substrate.

REFERENCES:
patent: 3303085 (1967-02-01), Price et al.
patent: 3612871 (1971-10-01), Crawford et al.
patent: 3677844 (1972-07-01), Fleischer et al.
patent: 3852134 (1974-12-01), Bean
patent: 4369370 (1983-01-01), Spohr

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