Method for monitoring and calibrating temperature in...

Thermal measuring and testing – Thermal calibration system

Reexamination Certificate

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C374S002000

Reexamination Certificate

active

07572052

ABSTRACT:
The present invention provides a non-destructive method for monitoring and calibrating chamber temperature. One embodiment of the present invention provides a method for measuring temperature comprising forming a target film on a test substrate at a first temperature, wherein the target film has one or more properties responsive to thermal exposure, exposing the target film to an environment at a second temperature in a range higher than the first temperature, measuring the one or more properties of the target film after exposing the target film to the environment at the second temperature, and determining the second temperature according to the measured one or more properties.

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patent: 2008/0002753 (2008-01-01), Timans
Sneh, et al article, Adsorption and Desorption Kinetics of H2O On A Fully Hydroxylated SiO2Surface, Dept. of Chemistry and Biochemistry, University of Colorado. Surface Science 364 (1996), pp. 61-78.

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